US Patent Issued to Applied Materials on Feb. 24 for "Methods of geometry parameters measurement for optical gratings" (California Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,510, issued on Feb. 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods of geometry parameters measurement for optical gratings" was invented by Yangyang Sun (San Jose, Calif.), Jinxin Fu (Fremont, Calif.), Ravi Komanduri (Milpitas, Calif.) and Chi-Yuan Yang (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to metrology measurement systems, and related methods. In one or more embodiments a system, includes a substrate support, and an optical arm. The optical arm includes a light source operable to project a first beam on a first light path. The optical arm also includes a first ...