ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,355, issued on Feb. 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Isolator for processing chambers" was invented by Akshay Dhanakshirur (Hubli, India), Saketh Pemmasani (Hyderabad, India), Mayur Govind Kulkarni (Bangalore, India) and Madhu Santosh Kumar Mutyala (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatus and methods for reducing undesirable residue material deposition and buildup on one or more surfaces within a processing chamber are provided herein. In embodiments disclosed herein, a processing chamber includes a chamber body having a chamber base, one or more sidewalls, and a chamber lid defi...