US Patent Issued to APPLIED MATERIALS on Feb. 24 for "Center feed symmetric flow valve for plasma chambers" (Indian Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,243, issued on Feb. 24, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Center feed symmetric flow valve for plasma chambers" was invented by Chetan Ramachandra Naik (Bengaluru, India) and Anand Kumar (Bengaluru, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of symmetric flow valves for use in substrate processing chambers are provided herein. In some embodiments, a symmetric flow valve includes: a valve body having sidewalls, a bottom plate, and a top plate that together define an interior volume, wherein the top plate includes a plurality of axisymmetrically disposed openings arranged in a non-linear manner, and w...