ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,185, issued on Feb. 17, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).
"Transparent heaters for improved epitaxy reactor productivity" was invented by Sathya Shrinivas Chary (San Francisco).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for heating a transparent component within a semiconductor processing chamber is described. The transparent component is heated using a transparent heater coupled to the transparent component. The transparent heater includes a support base, an electrode layer, and a capping layer. The electrode layer is a heating element. The transparent heater has an optical transparency of great...