US Patent Issued to Applied Materials on Feb. 17 for "Substrate handling system, method, and apparatus" (American, Indian Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,133, issued on Feb. 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Substrate handling system, method, and apparatus" was invented by Abhishek Chowdhury (Bangalore, India), Nataraj Bhaskar Rao (Bangalore, India), Edwin C. Suarez (Pleasanton, Calif.), Harisha Sathyanarayana (Bangalore, India), Diego Ramiro Puente Sotomayor (Phoenix), Qanit Takmeel (Mesa, Ariz.), Mohammad Kamruzzaman Chowdhury (Phoenix) and Arun Chakravarthy Chakravarthy (Tamil Nadu, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate handling system includes a fixed deposition ring having a plurality of circumferentially spaced notches along an outer e...