US Patent Issued to Applied Materials on Aug. 4 for "Cooled sputtering target for ion source" (Massachusetts Inventor)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,700,560, issued on Aug. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Cooled sputtering target for ion source" was invented by Ori Noked (Brookline, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion source with a target holder for holding a solid dopant material is disclosed. The target holder is mounted to a shaft, which may be in communication with an actuator, which allows the solid dopant material to be inserted and retracted from the arc chamber. The shaft and/or the target holder is actively cooled such that the solid dopant material remains below its melting point. In this way, the solid dopant material may be inserte...