US Patent Issued to Applied Materials on Aug. 25 for "Treatments to enhance material structures" (California Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,061, issued on Aug. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Treatments to enhance material structures" was invented by Srinivas Gandikota (Santa Clara, Calif.), Yixiong Yang (San Jose, Calif.), Jacqueline Samantha Wrench (Santa Clara, Calif.), Yong Yang (Mountain View, Calif.) and Steven C. H. Hung (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a high-Kappa dielectric cap layer on a semiconductor structure formed on a substrate includes depositing the high-Kappa dielectric cap layer on the semiconductor structure, depositing a sacrificial silicon cap layer on the high-Kappa dielectric...