US Patent Issued to Applied Materials on Aug. 25 for "Chamber with enhancement liner and methods for downstream residue management" (Indian, American Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,719,033, issued on Aug. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chamber with enhancement liner and methods for downstream residue management" was invented by Zaoyuan Ge (San Jose, Calif.), Manjunath Veerappa Chobari Patil (Karnataka, India), Prodosh Kumar Halder (Kolkata, India), Prasath Poomani (Tamilnadu, India), Badri N. Ramamurthi (Los Gatos, Calif.), Sungwon Ha (Palo Alto, Calif.) and Daemian Raj Benjamin Raj (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor processing chambers and systems, as well as methods of cleaning such chambers and systems are provided. Processing chambers and systems in...