US Patent Issued to Applied Materials on Aug. 18 for "RF blocker for uniformity control" (Massachusetts, Maine, New Hampshire Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,160, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"RF blocker for uniformity control" was invented by Vikram M. Bhosle (Reading, Mass.), Alexandre Likhanskii (Middleton, Mass.), Stacia Pacheco (Lincoln, Maine), John Robert Fairhurst (Plaistow, N.H.), Meng Cai (North Andover, Mass.), Cuiyang Wang (Andover, Mass.) and Deven Matthew Raj Mittal (Middleton, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing system with improved plasma density is disclosed. The system includes a plasma chamber having a base, chamber walls and a top wall. An antenna is used to generate RF energy that is induc...