US Patent Issued to Applied Materials on Aug. 18 for "Biasable electrostatic chuck" (American, Indian Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,162, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Biasable electrostatic chuck" was invented by Paneendra Prakash Bhat (Fremont, Calif.), Qiwei Liang (Fremont, Calif.), Douglas Buchberger (Livermore, Calif.), Dmitry Lubomirsky (Cupertino, Calif.), Naveen Kumar Nagaraja (Bangalore, India) and Vijay D. Parkhe (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. The electrostatic chuck body may define a backside gas lumen that extends through a surface of the ...