ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,825, issued on Aug. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Measurement of inherent substrate distortion" was invented by Piyush Kumar Pandey (Bangalore, India), Prabal Sen (Bangalore, India), Ganapathy Saravanavel (Madurai, India), Himadri Shekhar Handsa (Bangalore, India), Mohammed Dilkash Azam (Bangalore, India) and Sidharth Bhatia (Santa Cruz, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes obtaining first data indicative of a measured profile of a substrate. The method further includes obtaining second data indicative of a profile of a reference substrate. The method further includes determinin...