US Patent Issued to Applied Materials on April 7 for "Window logic for control of polishing process" (American, German Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,594,646, issued on April 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Window logic for control of polishing process" was invented by Volker Geissler (Freital, Germany) and Benjamin Cherian (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of controlling a chemical mechanical polishing system includes receiving a respective time-varying test signal from an endpoint detection system for each of a plurality of test substrates, simultaneously visually displaying the plurality of time-varying test signals on a display with the plurality of time-varying test signals overlaid on each other in a graph. receiving user...