US Patent Issued to Applied Materials on April 7 for "Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber" (American, Indian Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,560, issued on April 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber" was invented by Vishwas Kumar Pandey (Madhya Pradesh, India), Eric Kihara Shono (San Mateo, Calif.), Kartik Shah (Saratoga, Calif.), Christopher S. Olsen (Fremont, Calif.), Agus Sofian Tjandra (Milpitas, Calif.), Tobin Kaufman-Osborn (Sunnyvale, Calif.), Taewan Kim (San Jose, Calif.) and Hansel Lo (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure generally provides methods of providing at least metastable radical molecular spec...