US Patent Issued to Applied Materials Israel on Oct. 6 for "Machine learning based metrology for semiconductor specimens" (Israeli Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,484, issued on Oct. 6, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Machine learning based metrology for semiconductor specimens" was invented by Ilan Ben-Harush (Tel-Aviv, Israel), Rafael Bistritzer (Petach Tikva, Israel) and Yehoshua Cohen (Tel-Aviv, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method for examining a semiconductor specimen. The method includes obtaining a runtime image of a semiconductor specimen acquired by an examination tool; processing the runtime image to create one or more image strips each containing an edge, and for each image strip, extracting a sequence of topo ...