US Patent Issued to Applied Materials Israel on Oct. 27 for "Optimization of a metrology algorithm for examination of semiconductor specimens" (Israeli Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,022, issued on Oct. 27, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Optimization of a metrology algorithm for examination of semiconductor specimens" was invented by Rafael Bistritzer (Petach Tikva, Israel), Ilan Ben-Harush (Tel-Aviv, Israel), Mor Baram (Nes-Ziona, Israel), Tal Ben-Shlomo (Givatayim, Israel), Nir Billfeld (Levi) (Kiryat Ata, Israel) and Noam Teomim (Rehovot, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a metrology system and method. The method includes obtaining a set of tool parameters selected from multiple tool parameters characterizing the examination tool, varying a value of each...