ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,561,793, issued on Feb. 24, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Machine learning based examination for process monitoring" was invented by Noam Tal (Kiryat Ono, Israel), Boris Levant (Rehovot, Israel), Sergey Sinitsa (Holon, Israel), Boaz Sturlesi (Tel Aviv, Israel), Shay Yogev (Kibbutz Kfar Menachem, Israel), Assaf Ariel (Shoresh, Israel), Lilach Choona (Rehovot, Israel) and Shaul Pres (Tel Aviv, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method of examination of semiconductor specimens. The method includes generating a sequence of anomaly scores corresponding to a sequence of spec...