ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,701,967, issued on Aug. 4, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).
"Substrate handling system background" was invented by David Amarilio (Rehovot, Israel), Dima Apter (Rehovot, Israel) and Mariano Abramson (Rehovot, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate handling system, that includes (i) a vacuum booster for generating a pulse of first vacuum flow; (ii) a reference vacuum source for producing a reference vacuum flow; and (iii) an vacuum flow control unit that is configured to: (a) combine, during a boost period, the first and reference vacuum flows to provide a combined vacuum flow that is provided, vi...