US Patent Issued to Applied Materials, Regents of the University of California on April 21 for "Dielectric on dielectric selective deposition using aniline passivation" (California Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,758, issued on April 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and Regents of the University of California (Oakland, Calif.).

"Dielectric on dielectric selective deposition using aniline passivation" was invented by Keith T. Wong (Mountain View, Calif.), Srinivas D. Nemani (Saratoga, Calif.), Ellie Y. Yieh (San Jose, Calif.), Andrew C. Kummel (San Diego), Yunil Cho (San Diego) and James Huang (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a conductive material on a first dielectric layer, exposing the conductive material to aniline to produce a passivated surface of the conductive material...