US Patent Issued to Applied Materials, National University of Singapore on March 17 for "Cyclic alkyl amino carbene (CAAC) deposition by transmetallation" (Singaporean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,667, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore).

"Cyclic alkyl amino carbene (CAAC) deposition by transmetallation" was invented by Wei Chun Lim (Singapore), Andrea Leoncini (Singapore), Han Vinh Huynh (Singapore) and Sara Raquel Mota Merelo de Aguiar (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of depositing a passivation layer on a semiconductor substrate are described. The methods may include exposing a semiconductor substrate having a metal layer thereon to a precursor to form a passivation layer on the metal layer, the precursor having a...