US Patent Issued to American Air Liquide on July 21 for "Fluorination of ancillary ligands of group (III) precursors and their applications in vapor depositions" (Delaware Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,921, issued on July 21, was assigned to American Air Liquide Inc. (Newark, Del.).

"Fluorination of ancillary ligands of group (III) precursors and their applications in vapor depositions" was invented by Bradley McKeown (Newark, Del.) and Kayla Diemoz (Newark, Del.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a Group (III)-containing film on a substrate comprises exposing the substrate to a vapor of a Group (III)-containing film-forming composition that contains a Group (III)-containing precursor and depositing at least part of the Group (III)-containing precursor onto the substrate to form the Group (III)-containing film on t...