US Patent Issued to AIXTRON on March 17 for "Method for identifying substrates which are faulty or have been incorrectly inserted into a CVD reactor" (German, Belgian Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,674, issued on March 17, was assigned to AIXTRON SE (Herzogenrath, Germany).

"Method for identifying substrates which are faulty or have been incorrectly inserted into a CVD reactor" was invented by Utz Herwig Hahn (Raeren, Belgium), Martin Dauelsberg (Aachen, Germany) and Thomas Schmitt (Monchengladbach, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "With the aid of one or more optical sensors, substrates which are faulty or have been incorrectly inserted in a CVD reactor are identified. The one or more optical sensors sense properties of the surfaces of the substrates, for example layer thickness or temperature, before or during a treatme...