US Patent Issued to AIXTRON on March 17 for "CVD reactor having means for locally influencing the susceptor temperature" (German Inventor)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,670, issued on March 17, was assigned to AIXTRON SE (Herzogenrath, Germany).

"CVD reactor having means for locally influencing the susceptor temperature" was invented by Peter Sebald Lauffer (Aachen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "In the thermal treatment of substrates, a susceptor is used to hold at least one substrate. The susceptor can be heated with a heater and driven in rotation about a rotation axis by a rotary drive. Means are provided to influence the heat transfer to or from the susceptor in a locally limited manner, synchronized with the rotary movement of the susceptor, to equalize local temperature differences o...