US Patent Issued to AGC GLASS EUROPE on June 23 for "Silicon oxide coated polymer films and low pressure PECVD methods for producing the same" (Belgian Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,735, issued on June 23, was assigned to AGC GLASS EUROPE (Louvain-la-neuve, Belgium).

"Silicon oxide coated polymer films and low pressure PECVD methods for producing the same" was invented by Gregory Arnoult (Noville-les-Bois, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A stress-free transparent silicon oxide coated polymer substrates and a method for depositing a stress-free transparent silicon oxide based layer on polymer substrates using a PECVD device including at least one hollow cathode plasma source."

The patent was filed on Dec. 18, 2020, under Application No. 17/787,286.

*For further information, including images, charts and t...