US Patent Issued to AG MATERIALS TECHNOLOGY on Nov. 3 for "Nano-twinned ultra-thin metallic film structure and methods for forming the same" (Taiwanese Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,781,334, issued on Nov. 3, was assigned to AG MATERIALS TECHNOLOGY Co. LTD. (Hsinchu City, Taiwan).

"Nano-twinned ultra-thin metallic film structure and methods for forming the same" was invented by Chien-Hsun Chuang (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The nano-twinned ultra-thin metallic film structure includes a substrate and a nano-twinned metallic thin film on the surface of the substrate. The nano-twinned metallic thin film has a thickness of 0.5 micro metre to 3 micro metre and includes silver, copper, gold, palladium or nickel. The nano-twinned metallic thin film has a transition layer near the substrate and a twin...