US Patent Issued to Advanced Semiconductor Engineering on Oct. 27 for "Method of manufacturing circuit pattern structure and measurement method" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,895, issued on Oct. 27, was assigned to Advanced Semiconductor Engineering Inc. (Kaohsiung, Taiwan).

"Method of manufacturing circuit pattern structure and measurement method" was invented by Yu-Kai Lin (Kaohsiung, Taiwan) and Chih-Cheng Lee (Kaohsiung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a circuit pattern structure, a measurement method, and a circuit pattern structure are provided. The method of manufacturing the circuit pattern structure includes: forming a dielectric layer; forming at least one first pad at least partially in the dielectric layer; forming a second pad adjacent to the at least one first...