US Patent Issued to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA on Oct. 6 for "Chemical vapor deposition equipment and method therefor" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,511, issued on Oct. 6, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (Shanghai).

"Chemical vapor deposition equipment and method therefor" was invented by Gerald Zheyao Yin (Shanghai), Hailong Zhang (Shanghai), Yunling Pang (Shanghai) and Hai Cong (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a chemical vapor deposition equipment and method therefor, the equipment including: a reaction chamber; an outer housing provided outside the reaction chamber, an accommodation space being formed between the outer housing and the reaction chamber; a plurality of radiant heat sources provided in the a...