US Patent Issued to Advanced Material Solutions on Oct. 27 for "Method and system for selective recovery of monochlorosilane and dichlorosilane in polysilicon production process" (Montana Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,294, issued on Oct. 27, was assigned to Advanced Material Solutions LLC.

"Method and system for selective recovery of monochlorosilane and dichlorosilane in polysilicon production process" was invented by Chad Fero (Missoula, Mont.), Kevin Papp (Missoula, Mont.), Joah Smith (Lolo, Mont.) and Joshua Flynn (Missoula, Mont.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor depo...