US Patent Issued to Advanced Material Solutions on April 7 for "Chemical vapor deposition reactor in polysilicon production process" (Montana Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,589, issued on April 7, was assigned to Advanced Material Solutions LLC.

"Chemical vapor deposition reactor in polysilicon production process" was invented by Chad Fero (Missoula, Mont.) and David Keck (Missoula, Mont.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical vapor deposition reactor that increases the yield of polysilicon in a polysilicon manufacturing process is presented in this disclosure. A chemical vapor deposition reactor may include a heat transfer jacket that protrudes at an upper end as much as or more than the top end of a filament to reflect radiant heat back to a filament or polysilicon rod. The heat transfer jacket may...