US Patent Issued to Advanced Energy Industries on March 3 for "Compensation of impedance modulation in a plasma generator by frequency sweep" (Colorado Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,562, issued on March 3, was assigned to Advanced Energy Industries Inc. (Denver).

"Compensation of impedance modulation in a plasma generator by frequency sweep" was invented by Masahiro Watanabe (Windsor, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing system is disclosed. A very high frequency (VHF) generator delivers power to a plasma chamber, and a mid-frequency (MF) generator delivers power to the plasma chamber. The VHF generator includes a sensor configured to provide a signal indicative of an impedance of a plasma load that is presented to the VHF generator. The VHF generator further includes a frequency tuner config...