US Patent Issued to ACM RESEARCH (SHANGHAI) on Oct. 20 for "Drying apparatus and method based on supercritical fluid" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,775, issued on Oct. 20, was assigned to ACM RESEARCH (SHANGHAI) INC. (Shanghai).

"Drying apparatus and method based on supercritical fluid" was invented by Hui Wang (Shanghai), Shena Jia (Shanghai), Xiaofeng Tao (Shanghai), Bin He (Beijing), Xin Zhao (Shanghai), Yingnan Sun (Shanghai), Bin Li (Shanghai), Jun Wang (Shanghai), Jian Wang (Shanghai), Fuping Chen (Shanghai), Xiaoyan Zhang (Shanghai), Zhenming Chu (Shanghai) and Deyun Wang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A drying apparatus is based on supercritical fluid. The drying apparatus includes: an upper cover; a base, arranged below the upper cover and the base and the upp...