US Patent Issued to ABIT TECHNOLOGIES on Nov. 3 for "Microwave plasma generating apparatus, microwave plasma processing apparatus, and microwave plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,045, issued on Nov. 3, was assigned to ABIT TECHNOLOGIES Co. LTD (Tokyo).

"Microwave plasma generating apparatus, microwave plasma processing apparatus, and microwave plasma processing method" was invented by Kiyokazu Nakagawa (Tokyo) and Yoshihisa Usami (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A microwave plasma generating apparatus provided with a plurality of microwave plasma generating devices provided with a tubular container made of a dielectric material, a tubular chamber arranged to cover the tubular container, a gas supply port provided to an end of the tubular container, and a microwave introduction port provided at a side of t...