US Patent Issued to AaltoSemi on June 23 for "Substrate structure" (Chinese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,980, issued on June 23, was assigned to AaltoSemi Inc. (Nanjing City, China).

"Substrate structure" was invented by Min-Yao Chen (Nanjing City, China), Pei-Ching Li (Nanjing City, China) and Andrew C. Chang (Nanjing City, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate structure is provided, in which an insulator encapsulates a conductive pillar that is a single solid pillar body, and at least one wiring layer electrically connected to the conductive pillar is arranged on the insulator. Therefore, the conductive pillar is designed as a single solid pillar body to meet the requirements of thin lines, fine spacing and high-density con...