US Patent Issued to AAG Microtech (Changzhou), Ld. on May 26 for "Sound absorption material block and method made thereof" (Chinese Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,637,581, issued on May 26, was assigned to AAG Microtech (Changzhou) Co. Ld. (Changzhou, China).

"Sound absorption material block and method made thereof" was invented by Zhongyang Wang (Changzhou, China), Jie Zhang (Changzhou, China), Hezhi Wang (Changzhou, China) and Chao Wang (Changzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure discloses a sound absorption material block having a gradient pore diameter from inside to outside, including: an outer portion having a first pore diameter; and an inner portion encapsulated by the outer portion, having a second pore diameter; the first pore diameter is in a range of 20-200 m...