ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,728,499, issued on Sept. 8.
"Hybrid CMP conditioning head" was invented by David Earl Slutz (Bethlehem, Pa.).
According to the abstract* released by the U.S. Patent & Trademark Office: "In various implementations, a conditioning head includes a substrate comprising a substrate surface; and at least one raised non-planar abrasive region relative to the substrate surface. The non-planar abrasive region comprises an edge shaving region and a point cutting region, the ratio of the surface area of the edge shaving region to the point cutting region is at least 2:1; and wherein the cutting point region comprises one or more protrusions extending no more than 250 microns from the mean heigh...