US Patent Issued on March 31 for "Face mask" (Chinese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,588,721, issued on March 31.

"Face mask" was invented by Harry Nai Shee Lee (Kowloon, Hong Kong) and Tommy Yuk Yin Siu (Kowloon, Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a face mask comprising a compound structure with an inner layer and two sandwich layers, wherein the inner layer is made from a filter material for filtering particles and germs, the sandwich layers are made from a textile material, the inner layer is sandwiched by the sandwich layers, and the sandwich layers are bonded to the inner layer at least in sections along the perimeter of the face mask and in sections in the inner area of the face mask...