ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,380, issued on March 3.
"Lithography using spin isolated monochromatic electromagnetic radiation" was invented by Eric Arno Vigen (Sherman, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method including contacting for a period of time, and at a temperature, a portion of an uncured layer of a polymeric composition disposed over a substrate with a spin isolated beam of monochromatic electromagnetic radiation having a wavelength and an intensity sufficient to activate and at least partially cure the portion of the polymeric composition is disclosed herein."
The patent was filed on May 27, 2025, under Application No. 19/219,732.
*For further ...