ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,527, issued on March 17.
"Strain for degrading deoxynivalenol and use thereof" was invented by Huiying Luo (Beijing), Honghai Zhang (Beijing), Bin Yao (Beijing), Huoqing Huang (Beijing), Yaru Wang (Beijing), Yingguo Bai (Beijing), Xiaoyun Su (Beijing), Yuan Wang (Beijing), Tao Tu (Beijing), Jie Zhang (Beijing), Huimin Yu (Beijing), Xing Qin (Beijing) and Xiaolu Wang (Beijing).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to the fields of microorganisms, feed, food and ecological restoration, in particular to a strain for degrading deoxynivalenol (DON) and the use thereof. The strain has the deposit number CCTCC No. M 2...