ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,703,060, issued on Aug. 11.
"Environment-friendly polishing disc and processing technology thereof" was invented by Iuen-Chun Kim (Jinhua, China) and Yi Jin (Jinhua, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "An environment-friendly polishing disc and a processing technology thereof are provided by the present disclosure, and the present disclosure is related to the field of industrial electronic technology. The environment-friendly polishing disc, comprising a lower backsheet, a soft polishing layer on an upper side of the lower backsheet, and the soft polishing layer is a polyurethane synthetic resin containing polishing powder, and an upper...