GENEVA, March 19 -- ZEPHYRX LLC (2 3rd StSuite 201Troy, New York 12180) filed a patent application (PCT/US2025/045104) for "HIGH-QUALITY RESPIRATORY MEASUREMENTS" on Sep 05, 2025. With publication no. WO/2026/055465, the details related to the patent application was published on Mar 12, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HORTH, Jason (2 3rd StSuite 201Troy, New York 12180), DICESARE, Michael (2 3rd StSuite 201Troy, New York 12180)
Abstract: Measurement of quality metrics during respiratory measurements includes receiving sensor input, for instance from non-respiratory sensor(s)...