INTERNATIONAL PATENT: WESTERN DIGITAL TECHNOLOGIES, INC. FILES APPLICATION FOR "HIGH OXIDATION RESISTIVE CAP LAYERS FOR TOPOLOGICAL SEMI-METAL AND INSULATOR MATERIALS"

GENEVA, March 11 -- WESTERN DIGITAL TECHNOLOGIES, INC. (5601 Great Oaks ParkwaySan Jose, California 95119) filed a patent application (PCT/US2025/034208) for "HIGH OXIDATION RESISTIVE CAP LAYERS FOR TOPOLOGICAL SEMI-METAL AND INSULATOR MATERIALS" on Jun 18, 2025. With publication no. WO/2026/049844, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LE, Quang (c/o Western Digital Technologies, Inc.5601 Great Oaks ParkwaySan Jose, California 95119), YORK, Brian R. (c/o Western Digital Technologies, Inc.5601 Great Oaks Parkway...