International Patent: WAFER PROCESSING AUTOMATION PLATFORM AND WAFER COATING METHOD USING SAME

GENEVA, June 24 -- FOUNDATION FOR RESEARCH AND BUSINESS, SEOUL NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY filed a patent application (KR2025/020015) for “WAFER PROCESSING AUTOMATION PLATFORM AND WAFER COATING METHOD USING SAME”. With publication no. WO/2026/117055, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/16

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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