GENEVA, July 9 -- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC. filed a patent application (CN2025/144635) for “WAFER POLISHING ENDPOINT DETECTION METHOD”. With publication no. WO/2026/145143, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B24B 37/013
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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