International Patent: WAFER EPITAXIAL-FILM THICKNESS MEASUREMENT METHOD AND SYSTEM BASED ON TRAJECTORY ADAPTATION

GENEVA, Oct. 5 -- GAZER PRECISION TECHNOLOGY (SUZHOU) CO., LTD. filed a patent application (CN2026/085124) for “WAFER EPITAXIAL-FILM THICKNESS MEASUREMENT METHOD AND SYSTEM BASED ON TRAJECTORY ADAPTATION”. With publication no. WO/2026/200761, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G01B 11/06

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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