International Patent: VAPOR DEPOSITION SOURCE AND METHOD FOR MANUFACTURING VAPOR DEPOSITION SOURCE

GENEVA, Aug. 14 -- CANON OPTRON, INC. filed a patent application (JP2026/004552) for “VAPOR DEPOSITION SOURCE AND METHOD FOR MANUFACTURING VAPOR DEPOSITION SOURCE”. With publication no. WO/2026/168602, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 14/24

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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