International Patent: ULTRA-THIN, ULTRA-LOW DENSITY FILMS WITH THIN SILICON CARBIDE COATING FOR EXTREME ULTRAVIOLET LITHOGRAPHY

GENEVA, Oct. 9 -- LINTEC OF AMERICA, INC. filed a patent application (US2025/030199) for “ULTRA-THIN, ULTRA-LOW DENSITY FILMS WITH THIN SILICON CARBIDE COATING FOR EXTREME ULTRAVIOLET LITHOGRAPHY”. With publication no. WO/2026/212644, here are the other details related to the patent application:

Kind: Initial Publication without ISR [A2]

IPC: G03F 1/62

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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