GENEVA, Aug. 21 -- NEXWAFE GMBH filed a patent application (EP2026/053974) for “TURNING DEVICE AND TREATMENT DEVICE FOR THE WET-CHEMICAL TREATMENT OF A SEMICONDUCTOR SUBSTRATE, AND METHOD FOR TURNING A SEMICONDUCTOR SUBSTRATE”. With publication no. WO/2026/171930, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 72/30
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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