INTERNATIONAL PATENT: TSINGHUA UNIVERSITY, 清华大学, INTERNATIONAL INNOVATION CENTER OF TSINGHUA UNIVERSITY, SHANGHAI, 上海清华国际创新中心 FILES APPLICATION FOR "USE OF POLYTELLUOXANE IN NON-CHEMICALLY AMPLIFIED PHOTORESIST"

Posted On: 2026-03-22

GENEVA, March 22 -- TSINGHUA UNIVERSITY (No. 1, QinghuayuanHaidian District, Beijing 100084), 清华大学 (中国北京市海淀区清华园1号), INTERNATIONAL INNOVATION CENTER OF TSINGHUA UNIVERSITY, SHANGHAI (2F, Building 2, 602 Tongpu RoadPutuo District, Shanghai 200062), 上海清华国际创新中心 (中国上海市普陀区同普路602号2号楼2楼) filed a patent application (PCT/CN2025/084102) for "USE OF POLYTELLUOXANE IN NON-CHEMICALLY AMPLIFIED PHOTORESIST" on Mar 21, 2025. With publication no. WO/2026/056241, the details r...

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इस लेख के रीप्रिंट को खरीदने या इस प्रकाशन का पूरा फ़ीड प्राप्त करने के लिए, कृपया हमे संपर्क करें.

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INTERNATIONAL PATENT: TSINGHUA UNIVERSITY, 清华大学, INTERNATIONAL INNOVATION CENTER OF TSINGHUA UNIVERSITY, SHANGHAI, 上海清华国际创新中心 FILES APPLICATION FOR "USE OF POLYTELLUOXANE IN NON-CHEMICALLY AMPLIFIED PHOTORESIST"