INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "DEFECT DETECTION METHOD USING HEAT"

GENEVA, March 18 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/039464) for "DEFECT DETECTION METHOD USING HEAT" on Jul 28, 2025. With publication no. WO/2026/054896, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MALEEV, Ivan (2859 Bayview Dr.Fremont, California 94538)

Abstract: A method for detecting a defect in a bonded wafer includes receiving the bonded wafer on a wafer ...