INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "PLASMA PROCESSING DEVICE AND ETCHING METHOD"

GENEVA, April 7 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2025/032590) for "PLASMA PROCESSING DEVICE AND ETCHING METHOD" on Sep 16, 2025. With publication no. WO/2026/070514, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KASHIWAZAKI Masakatsu (c/o...