GENEVA, April 18 -- TECHNISCHE UNIVERSITEIT DELFT (Stevinweg 12628 CN Delft) filed a patent application (PCT/EP2025/078839) for "METHOD OF MANUFACTURING A SHADOW MASK FOR STENCIL LITHOGRAPHY" on Oct 07, 2025. With publication no. WO/2026/077994, the details related to the patent application was published on Apr 16, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): FINKEL, Matvey (c/o TU Delft, Innovation &Impact Centre, Postbus 52600 AA Delft), DICARLO, Leonardo (c/o TU Delft, Innovation &Impact Centre, Postbus 52600 AA Delft), THYIAGARAJAN, Kishore Kumar (c/o TU Delft, Innovation &Impact Cent...